RTP polysilicon deposition

06/01/1998

RTP polysilicon deposition

Designed for rapid thermal process (RTP) polysilicon deposition, the Epsilon 2500RTP uses silane as the silicon source gas and hydrogen as the carrier gas, a combination that yields good performance at low cost. Factors that contribute to low cost of ownership include growth rate (of medium to heavily doped silicon), layer uniformity, run-to-run repeatability, in-situ reactor cleaning efficiency, and use of an atmospheric pressure process. At atmospheric pressure, process conditions can be selected that lead to a seamless filling of deep (aspect ratio of ~40) sub-?m trenches with arsenic-doped polysilicon. The 2500RTP is fully modular - the reactor section can be used on a cluster platform for integration with other pre- and/or post-processing modules. ASM America Inc., Phoenix, AZ; ph 602/470-5801, fax 602/437-1403.