FIB/SEM workstation

06/01/1998

FIB/SEM workstation

The DualBeam XL860 FIB/SEM workstation features robotic sample handling and active environment compensation, combined with very high-resolution SEM imaging and rapid, precise FIB milling. It is designed for process evaluation, yield management, and failure analysis, supporting design rules to 0.18 ?m and beyond. Its software automatically handles the complex interrelationships between SEM and FIB operation, allowing the operator to concentrate on analysis of the results. With Class 1-compatible robotics and active compensation for vibration and stray fields, the XL860 is designed for the hostile fab environment. Wafers no longer need to be removed from the cleanroom for advanced defect characterization and analysis. Location of the tool directly in the fab gives immediate information feedback that makes possible real-time production line adjustments, avoiding scrap and improving yields. SEM resolution is 3 nm over the 1-30 kV range, and this performance is achieved even up to 60? tilted view and at a very short 5-mm working distance. FEI Co., Hillsboro, OR; ph 503/640-7500, fax 503/640-7509.