Post-etch residue removal

06/01/1998

Post-etch residue removal

EKC325 is an aqueous organic post-etch residue remover for sub-0.25-?m processes in which electrical CDs are critical. The formulation removes hard-to-clean organic and metallo-organic polymers that are generated during high-performance etching of dielectrics and metals. It also neutralizes and removes corrosive Cl, HBr, and F materials absorbed on wafers after processing with HBr/Cl2 or CF4 - commonly used during HDP etch to improve resist performance. EKC Technology Inc., Hayward, CA; ph 510/784-9119, fax 510/784-9181, www.ekcnews.com.