Thin-film thickness mapping

06/01/1998

Thin-film thickness mapping

The F50 thin-film thickness mapping system automatically measures the thickness of oxides, nitrides, resists, polymers, and other films used in III-V and LCD fabrication. Films between 20 nm and 30 ?m can be measured on substrates with diameters up to 8 in. The system also models and characterizes many complex multilayer optoelectronic structures, including vertical-cavity lasers and distributed Bragg reflectors. Filmetrics Inc., San Diego, CA; ph 619/554-0005, fax 619/554-1311, e-mail [email protected], www.filmetrics.com