Fast photospeed photoresists

06/01/1998

Fast photospeed photoresists

OiR 672 and OiR 674 i-line photoresists perform at a fast photospeed of 130 mJ/cm2 - an optimal range for use with new i-line scanners. They offer a wide exposure latitude and depth of focus for 0.35-?m features. OiR 672 is designed for reflective substrates, and 674 for nonreflective substrates (bottom ARC and TiN). Both resists show good performance for contact hole/via layers, with 674 performing at 200 mJ/cm2 on contact holes down to 0.35 ?m. Olin Microelectronic Materials, Norwalk, CT; ph 203/750-2824, fax 203/750-3913.