Gas diffuser

05/01/1998

Gas diffuser

The new Chamberguard FV-50K Diffuser provides gentle laminar flow for wafers during venting of loadlock, cooling and transfer, while protecting wafers from particles inside and outside the chamber. The gas diffuser allows clean venting of chambers in as little as 10 seconds and includes a highly retentive nickel membrane that removes particles greater than 0.003 microns from incoming gas and prevents particle contamination from being introduced to the wafer chamber or onto the wafer surface. It is designed for easy installation or retrofit using standard connections. Millipore Corp., Bedford, MA; ph 617/275-9200.