Korean LG Group Semicon Wales Product upgrades facility to 0.20 micron

05/01/1998

Korean LG Group Semicon Wales project upgrades facility to 0.20 micron

The Korean LG Group, Newport, Wales, recently announced plans to upgrade its working technology at its LG Semicon Wales (LGSW) facility, currently under construction, to work in a 0.20-micron technology environment. The plans for the upgraded technology have been drawn up and will position the facility as one of the first locations in the world to be working at this level.

The LG Group`s Welsh project comes at a time when the company is pressing on with its ?1.3 billion investment despite adverse conditions in South Korea. Officials close to the project say the decision to upgrade technology despite the economic condition of the Asian economy is based on market forecasts for the semiconductor industry in 1999, when the Wales plant is due to come on line.

"The continued good management of this project against the background of challenging economic conditions in Korea is an absolute priority for the company," said LGSW managing director, Joseph Jun. "That includes looking ahead to ensure we enter the world market with a product that will keep us ahead of our competitors."

LGSW is recruiting key personnel and developing the work force and products for the facility. Currently, LGSW employs 110 people. Once complete, the facility will create 1700 jobs. Training programs are already under way in both Newport and Korea.