Poly-etch system

03/01/1998

Poly etch system

The TCP 9400PTX etch system is optimized for such applications as advanced poly/polycide gate etch and shallow trench isolation for 0.18-?m technology. It is configured for the Alliance platform, which maximizes productivity while maintaining a small footprint, and handles up to four process modules. An advanced pressure control valve (pendulum valve) provides accurate pressure control, low particles, higher mean time between cleans, and shorter clean time. Removable chamber and manifold liners have been added, covering almost the entire interior of the chamber and manifold, thus reducing mean time to clean. Improvements to the lower RF and ESC power supply systems contribute to higher mean time between failure. Lam Research Corp., Fremont, CA; ph 510/572-4538, fax 510/572-2935, e-mail [email protected], www.lamrc.com.