Article advice

01/01/1998

Article advice

I have three suggestions about topics for future articles in Solid State Technology: cleaning techniques for x-ray mask manufacturing process; cleaning techniques for deep narrow trench; and dry front-end processes, such as dry resist, development, etching, and cleaning. These topics are important for future semiconductor processing. I hope SST can invite experts on these topics to present their results or technology.

Fu-Hsiang Ko

associate researcher, National Nano Device Laboratories

Hsinchu, Taiwan, [email protected]

Thank you for your interest in Solid State Technology. Dry cleaning and dry processing are becoming more important as device dimensions shrink. Likewise, x-ray mask cleaning techniques will be essential if x-ray lithography is to be viable for manufacturing. Readers interested in contributing articles on these or any other topics should contact me.

Katherine Derbyshire

Solid State Technology

Ten Tara Blvd., Fifth Floor, Nashua, NH 03062; ph: 603/891-9216, [email protected]