Issue



Gas diffuser


01/01/1998







Gas diffuser

The Chambergard FV-50K diffuser provides gentle laminar flow for wafers during venting of loadlock, cooling, and transfer chambers while protecting wafers from particles inside and outside the chamber. It allows clean venting of chambers in as little as 10 sec, and it can cut by up to 90% the time taken for controlled vent-up procedures of standard-size chambers using VCR fittings. Chambergard is easy to install or retrofit using

standard connections and needs no special tooling or adapters. A highly retentive nickel membrane removes particles >0.003 ?m from incoming gas. Millipore Corp., Bedford, MA; ph 800/645-5476, fax 617/275-5550.