Double brush scrubbing system

01/01/1998

Double brush scrubbing system

Used in the Evergreen series of wafer cleaners/processors (which support processes including post-CMP oxide and tungsten cleaning), this double brush system simultaneously scrubs both top and bottom of the wafer without spin chuck surface contact or marking. The wafer rides on air bearings during cleaning. The system incorporates advanced robotics and computer control; dual sets of contra-rotating scrub brushes, programmable for motion and pressure, both scrub the surface and drive the rotation of the wafer by surface friction. Solid State Equipment Corp., Horsham, PA; ph 215/328-0700, fax 215/328-9410.