Product News
09/01/1999
Robotics/Automation
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Atmospheric robot. The AquaTran 7, Model AQR 7S, is a high-performance 4-axis robot for 300mm-wafer handling in wet and/or corrosive environments. It uses proven direct-drive technology and DSP-based controls for R, q, and Z motion, as well as a precision wafer inversion axis mounted at the wrist of the robot arm. An advanced wafer mapping feature allows precise determination of wafer location and position fault detection for almost all industry-standard wafer materials and edge profiles. AquaTran 7's patented motion control features, Time Optimal Trajectory and Time Optimal Path, combined with continuous rotation capability, allow very high operating speeds with vacuum grip or passive substrate support. The Off-Center Pick feature permits access to multiple, orthogonal placed cassettes, FOUPs, and process modules, without the need for an additional traverser mechanism. Brooks Automation Inc., Chelmsford, MA; ph 978/262-2700, fax 978/262-2500, e-mail [email protected].
Contamination Control
PCS analyzer. The N4 Plus is a photon correlation spectroscopy (PCS) analyzer that determines particle size by measuring the rate of fluctuation in laser light intensity scattered by particles as they diffuse through a fluid. This nondestructive technology can determine a particle's size down to 3nm; it is particularly useful for determining particle size and contaminants in CMP slurries. The analyzer has six fixed measurement angles for improved sub-µm particle detection and sizes quickly and accurately due to its multi-Tau correlator. N4 Plus software provides a flexible and user-friendly Windows interface. Beckman Coulter, Hialeah, FL; ph 305/380-3810, www.beckmancoulter.com.
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Airborne contamination monitoring. The AirSentry-IMS system, for airborne contamination monitoring in DUV lithography, gives complete coverage for the wide range of compounds that can attack photoresist. These low-level contaminants can vary greatly, from bases such as ammonia, amines, and NMP to acids such as hydrogen fluoride and chlorine. The system uses the proven technology of ion mobility spectrometry to perform continuous real-time measurements. This is a fast and highly specific analytical method with sensitivity in the sub-ppb concentration range. AirSentry-IMS can be configured to monitor up to 45 sample points. A flat-panel touchscreen display is the operator interface for an integrated Windows NT workstation that presents current concentrations, sample trending, and alarm status. All data, alarms, and events are continuously logged to a high-performance historical database. Molecular Analytics, Sparks, MD; ph 410/472-2146 ext 104, fax 410/472-2156, e-mail [email protected].
Lithography filter media. LifeSpan Plus molecular filtration media is formulated to protect lithography tools from airborne molecular contaminants such as ammonia, NMP, and harmful organics. The enhanced media can double filter life-expectancy, and it is chemically stable, environmentally friendly, and free of the risk of using a dopant-related species such as phosphoric acid, which is a commonly used impregnant in some carbon filters. LifeSpan Plus is available for a full range of new stepper, scanner, and track models, and is also compatible with this company's installed base of CFS and LithoGuard molecular filtration systems. Donaldson Co. Inc., Minneapolis, MN; ph 612/887-3597, fax 612/887-3155, e-mail [email protected], www.donaldson.com.
Hardware/Accessories
X-Y air-bearing stage. The Triathlon Series air-bearing stage features an active-yaw rotation axis that provides very good straightness of travel and eliminates the need for a separate theta device. It uses an exclusive algorithm to control the yaw of the x-axis rail. Using dual encoder feedback from the two y-axis motors, the active-yaw rotation axis feature dynamically compensates for guideway error in the x-axis travel and allows adjustment for misalignment. Flexures at each end of the x-axis rail provide mechanical movement, allowing up to ±0.5° of rotation to correct the yaw motion between the two motors. Dover Instrument Corp., Westboro, MA; ph 508/366-1456, fax 508/366-9774, e-mail [email protected], www.doverinstrument.com.
Corona ionizer. The QuadBar Model 4630 corona ionizer provides effective static charge control as close as 3 in. from a product surface in the ambient air inside the tight spaces of production equipment. Using intrinsically balanced IsoStat technology, QuadBar comes with single crystal silicon emitter points, the industry standard material for Class 1 cleanroom (or better) environments. Its 3.6 in. size, and a system design that performs without airflow, make QuadBar highly suitable for minienvironments and process tools where both space and laminar airflow are at a minimum. Ion Systems, Berkeley, CA; ph 510/548-3640 ext 618, fax 510/548-0417, e-mail [email protected], www.ion.com.
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Excimer VUV sources. These excimer radiation sources provide a wavelength of 172nm and a photon energy of 7.2 eV, for fast and efficient wafer processing. The VUV sources are used for activating or functionalizing surfaces, for modifying thin layers, and for photochemical deposition from the vapor phase. Excimer radiation sources operate at significantly lower cost/photon compared to lasers and permit large-area exposure. Standard radiation sources with a length of up to one meter provide power of 15 W/cm and a service life of 1000 hours at a power drop <20%. The sources are equally well suited to applications in a vacuum and to exposure under inert gas atmosphere. Heraeus Noblelight GmbH, Kleinostheim, Germany; ph 49/6027-507-480, fax 49/6027-507-410,e-mail [email protected].
Process Equipment
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Variable-frequency generator. The HFV-L is a 3000 W variable-frequency generator designed primarily for use with 200 and 300mm wafer processing equipment. It is especially suitable for PVD, PECVD, etch, and other inductively coupled plasma applications, and it provides flexibility through digitally synthesized variable-frequency output and microprocessor control. The output frequency range is 1.765 to 2.165 MHz. Frequency tuning parameters that reside in firmware can be customized to ensure reliable operation with a wide variety of chamber configurations and process recipes. Features include 2MHz, digitally synthesized variable frequency; load power or forward power regulation modes; 3kW output level; internal diagnostics to verify proper operation; standard rack dimensions with 5.25-in. height; and water cooling for reliable, consistent operation. Advanced Energy Industries Inc., Fort Collins, CO; ph 970/407-6252 or 970/407-6280, e-mail [email protected], www.advanced-energy.com.
Endpoint detection. The OPTIMA 9000 Series Model 9225 endpoint control system accurately and consistently detects endpoints in real time during wafer spin processing. The system features high sensitivity to very small changes in wafer surface characteristics, allowing distinguishable transitions between different depositions of the same film. Processes addressed include copper removal, front and backside film removal, wafer thinning, and removal of polymers. The system is designed for full integration with most spin processing equipment. Luxtron Corp., Santa Clara, CA; ph 800/627-1666, fax 408/727-1677, e-mail [email protected], www.luxtron.com.
Gases/Gas Handling
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Gas purifiers. The UltraPure Eliminator UHP is a room-temperature gas purifier that offers multi-contaminant removal (including THC) to sub-ppb levels (0.5 ppb). These dual- and triple-stage purifiers can be regenerated for years of use, giving lower cost of ownership than conventional resin-based purifiers. The Omni UHP gas purifier offers a simple plug-and-purify concept, without complicated electrical wiring, temperature control, and setpoint calibrations. Flows up to 100 slpm, outlet impurities to <1 ppb, and multi-contaminant removal that includes nitrogen, hydrogen, and THC from many process gases, make Omni well-suited to many semiconductor applications. NuPure Corp., Manotick, Canada; ph 613/692-5349, fax 613/692-1872, e-mail [email protected].
Vacuum Equipment
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Variable-speed pump. The UniDry pump has a tongue-and-groove design that uses no water, has low power consumption and low nitrogen consumption. The variable-speed control option eliminates the need for throttle valves and their associated costs. UniDry can operate continuously at atmosphere and has a high volume flow rate of 35 cfm, with an ultimate vacuum of 2x10-2 torr. The temperature-management system keeps temperature constant throughout the pump, re ducing condensation and improving uptime performance. In combination with the Vacuum Roots pump, the UniDry can achieve pumping speeds up to 650 cfm. Pfeiffer Vacuum Inc., Nashua, NH; ph 603/578-6500, fax 603/578-6550, e-mail [email protected], www.pfeiffer-vacuum.com.
Lithography
Photomask inspection. The 382-PMI photomask inspection station uses bright-field and dark-field illumination modes for fast and accurate detection, classification, and logging of defect locations in photomasks. The two-step process first detects the defects using top and bottom dark-field illumination simultaneously, then provides defect classification (identification, sizing and location) using top and bottom bright-field illumination, either independently or in combination with color contrast filters. This is an effective procedure because both dark-fields used simultaneously allow the detection of all defects in one scan. Probing Solutions Inc., Dayton, NV; ph 702/246-0999, fax 702/246-0480, e-mail [email protected].
Broadband 1x stepper lens. This new broadband 1x stepper lens, capable of exposing both i-line and g-line photo sensitive films on the same stepper, has a high wafer plane irradiance that results in low exposure time and increased throughput at high dose exposures. In addition, the lens design has multiple field-size configuration options: 44 x 22mm for mix-and-match with this company's reduction steppers, 34 x 26mm for mix-and-match with new step-and-scan lithography tools, and 50 x 25mm for very large exposure area applications. The lens also offers an elevated degree of process latitude with 2µm resolution and >5µm usable depth of focus. Ultratech Stepper Inc., San Jose, CA; ph 408/321-8835, fax 408/577-3379, e-mail [email protected], www.ultratech.com.
Wafer Handling
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Wafer code reader. The LH890 is a film frame magazine-to-magazine system that automatically reads wafer codes. The wafer code is translated to a corresponding bar code label, which can be automatically printed and applied to the film frame adjacent to the wafer. The label can be automatically read to confirm readability and agreement with the wafer code. The alternative technique is to read the wafer code and a film frame code, then combine them in the database, eliminating the need for a bar code label. The system can be equipped with the ability to recall factory net data. Using magazine identification, either via bar code or operator-entered magazine or lot number, the system can download whatever information is available. Longhill Industries Ltd., Kowloon, Hong Kong; ph 408/496-0686, fax 408/988-4482, e-mail [email protected].
Chemicals/Chemical Handling
Pressure transducer. The APT is an ultrahigh-purity, all-316L stainless steel, flow-through pressure transducer that is compact (2.25 x 2.0 x 1.25 in.) and capable of measuring either differential or gauge pressure from inches of water to thousands of pounds. APT is a magnetic transducer, but because of its proprietary design it can be constructed with nonmagnetic materials. Unlike strain gauge transducers or capacitance manometers, there is no sensing structure attached to either side of the 316-L SS diaphragm. Dual outputs of 0 - 5 Vdc and 4-20 mA are provided with user-supplied power of 12-30 Vdc. The transducer is intrinsically safe to an overpressure of 3000 psi. It is electro-polished, He leak checked, has zero dead volume, has a total internal volume of 0.05 in.3, and is highly accurate at ± 0.1% of reading or better. Advanced Process Technology Inc., Richardson, TX; ph 972/238-1298, fax 972/669-9552, e-mail [email protected].
Metrology
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Quadrupole mass spectrometer. The 3F/1000 series high-power, high-performance quadrupole mass spectrometer offers optimum sensitivity and mass resolution for mass range applications to 2500 amu. The triple-stage mass filter is available with pole diameters of 9mm and 12mm. Coupled with the 200 W RF power source, operating at frequencies to 5MHz, performance is optimized for low mass to high mass for measurements as diverse as deuterium/tritium and cluster analyses. Systems are compatible with this company's full accessory range, including gas and molecular beam ion sources, axial and sector field energy analyzers, wide-range pulse ion counting detectors, and integrated UHV vacuum stages, allowing direct sampling of ions, neutrals, and radicals from processes at vacuum to atmospheric pressure. Hiden Analytical Ltd., Warrington, UK; ph 44/1925-445225, e-mail [email protected], www.hiden.co.uk.
Ellipsometer. The Sentech SE400 integrates a powerful software package with a discrete wavelength ellipsometer, greatly speeding the measurement of thickness and refractive index of single- and double-layer films. It features a series of dialog boxes for setting up ellipsometric measurements, including a library of standard data for known structures such as oxides and nitrides on silicon. Once set up, the ellipsometric interpolation is available at the click of a mouse to obtain the parameters psi and delta and the film thickness and refractive index. This process, taking up to an hour with a manual instrument, can be achieved in a few minutes. Micro Photonics, Allentown, PA; ph 610/366-7103, e-mail [email protected], www.microphotonics.com/pressinfo.html.
Packaging/Assembly/Test
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Machine vision for BGAs. BGA II inspects ball grid arrays (BGAs) for missing, misplaced, or improperly formed solder balls. Based on the MVS-8100 series hardware architecture, it combines the accuracy and reliability of the original BGA inspection package with MMX-accelerated inspection capability and support for higher-resolution cameras. The system can inspect up to 10,000 solder balls/sec and offers support for the large-format, high-resolution cameras needed to inspect today's smaller-sized, more densely populated devices. BGA II's masking feature enables users to "mask" out extraneous marks on a device that might be mistaken for solder balls, reducing error and improving throughput. Cognex Corp., Natick, MA; ph 508/650-3140, fax 508/650-3333, e-mail [email protected], www.cognex.com.
Flash memory test. The Matrix Test process is a zero-footprint, in-line flash memory test system that integrates a Kalos nonvolatile memory tester with a Fico strip-based test handler. Appropriate for a large variety of package types, this integrated solution can test a strip of flash memory devices without singulating the parts, or separating them from the leadframe or strip. This approach improves throughput and overall cycle time while optimizing floorspace, power, and parts handling. Credence Systems Corp.,Fremont, CA; ph 510/623-4774, fax 510/623-2524, e-mail [email protected], www.credence.com.