300-mm wafer contamination monitor

03/01/1999

300-mm wafer contamination monitor

The ATOMIKA TXRF 8300W is a wafer contamination monitor that measures metal contaminants on 300-mm wafer surfaces using total x-ray fluorescence technology. Contaminants can be measured on the surface and within the first few nanometers below. Applications include inspection of starting material, control and optimization of cleaning processes, and equipment setup and control. The tool works with a minienvironment (FOUP) and supports fab automation (GEM/SECS). It operates under ambient conditions with sealed x-ray tubes, resulting in a small footprint - 1.4 m2. Additional software features include fully automated measurement routines for FOUPs up to 25 wafers. Also available are 200-mm options with or without SMIF. ATOMIKA Instruments GmbH, Oberschleissheim/Munich, Germany; ph 49/89-315-89141, fax 49/89-315-5921, e-mail [email protected], www.atomika.com.