Field emission SEM

03/01/1999

Field emission SEM

The LEO 1560 field emission scanning electron microscope combines a large cylindrical chamber capable of handling wafers up to 200 mm with the ultrahigh-resolution GEMINI column, designed for high probe current and good beam stability over a wide operating voltage range. With its 8-in. air lock and high-precision, fully motorized 6-axis stage, the 1560 is well-suited to almost all semiconductor applications. Short transfer cycles guarantee a high specimen throughput. Simultaneous high-resolution imaging (SE and BSD) and x-ray analysis are possible due to the low analytical working distance of 8.5 mm. The integral Windows control system offers a wide range of image archiving, networking, and hardcopy solutions. User access files can be set up by the system supervisor using the built-in Administrator utility. Wafer navigation software, using KLA-Tencor data for defect review, is available as an option. The totally oil-free pumping system and optional stainless steel tabletops allow installation even in the highest class of cleanroom. LEO Electron Microscopy Ltd., Cambridge, UK; ph 44/1223-414166, fax 44/1223-412776, e-mail [email protected], www.leo-em.co.uk.