ArF scanning stepper

03/01/1999

ArF scanning stepper

The FPA-5000AS1 ArF excimer laser scanning stepper realizes 0.13-?m linewidths for =1-Gbit DRAMs and 1-GHz-class microprocessor development on either 200- or 300-mm wafer substrates. It has the same platform as the dual-era FPA-5000ES2 KrF scanning stepper, which was introduced recently for volume production. The platform allows easy field changeover from 200 to 300 mm with a simple conversion kit. For 193-nm wavelength exposures, the 5000-AS1 contains a new reduction projection lens and illumination system. These 193-nm optics incorporate high-purity calcium fluoride elements and aspherical surfaces to provide high-contrast imaging and very low distortion. With the 0.60 NA projection lens, annular illumination, and adequate resists, the AS1 allows lithography process development down to 130-nm features. Like its full-field KrF mate, the new system features a 4? reduction lens for single exposures over a 26 ? 33-mm field size. Canon USA Inc., Semiconductor Div., Irving, TX; ph 972/409-7800.