Scotland lithography conference

01/01/1999

Scotland lithography conference

A call for papers has been issued for the Conference on Lithography for Semiconductor Manufacturing, scheduled to be held in Edinburgh, Scotland, during the next European Symposium on Microelectronic Manufacturing Technologies (May 19-21). With a major focus on sub-0.25-?m technologies, the conference will place a special emphasis on novel optical techniques, new resist and antireflective materials, linewidth and overlay metrology, and advances in imaging equipment and technology. Chris Mack of FINLE Technologies, Austin, TX, and the University of Edinburgh`s Tom Stevenson are the conference chairs; Mack can be contacted via email at [email protected].