An example: Eatons approach

01/01/1999

An example: Eaton`s approach

The trend to integrate processes and process tools is driving productivity and efficiency improvements and has motivated Eaton Semiconductor Equipment Operations to expand its product offering and knowledge base. In addition to the Implant Systems Division, with its full range of ion implantation capability, the Fusion Systems Division provides advanced photoresist processing solutions, including photostabilization and resist strip, and the Thermal Processing Systems Division offers both rapid single-wafer and fast-ramp batch annealing processes. In several advanced process development applications, the interaction among these divisions is important, providing the ability to generate interdependent process data shared among them. Instead of focusing solely on ion implantation as a unit process, the focus expands to a doping sequence consisting of any or all of the following (see figure):

1. an optional photostabilization treatment providing improved photoresist integrity;

2. ion implantation;

3. a resist strip with chemical species designed to provide a residue-free surface; and

4. a RTP process to anneal and activate the dopant.

By expanding its capabilities in the doping sequences used to form integrated circuits, Eaton has enlarged the horizon of potential productivity benefits that may be realized by IC manufacturers, enabling quicker access to process data affected by multiple unit processes. Even in cases where the unit processes within a process sequence are orthogonal (do not strongly interact), documented data that demonstrate this are useful, since they allow for future flexibility in the process sequence.