Europe

12/01/1996

Europe

ASM Lithography (ASML) of Veldhoven, Netherlands, and IMEC of Leuven, Belgium, have formed a strategic alliance to provide training for personnel in future DUV fabs. DUV is moving into production faster than anticipated, with 20-25% of stepper shipments anticipated for 1997 expected to be DUV tools. ASML and IMEC have adopted a pro-active approach to shortening the learning curve for this new technology. The alliance will offer one, one-week and two, two-week courses to prospective DUV engineers, employing the IMEC DUV pilot line as well as classroom instruction. The first class of six Taiwanese engineers began on July 7, 1996.

VG Gas Analysis Systems, Cheshire, England, a maker of mass spectrometers for process gas analysis, has acquired the residual gas analyzer (RGA) business of VG Microtech to offer a greater range of technology and systems. The RGA product line complements VG Gas`s current business, which has already incorporated the quadrupole mass spectrometer into its process systems. VG Gas is part of the Thermo Instruments Group of companies.

STEAG MicroTech GmbH, Essen, Germany, has spun off its product divisions for compact disc and photomask equipment in order to focus service in these areas. STEAG HamaTech GmbH, the new and separate company supplying photomask processing equipment, will hire 50 more people and will receive DM9 million in capital from the parent company. HamaTech will also expand its Sternenfels facility, due online in May 1997.

Nikon Precision Europe GmbH (NPE), Frankfurt, Germany, will build a DM50 million education and application center in Livingston, Scotland. The 3000 m2 facility will feature a 1000 m2 cleanroom, which will feature a mix of i-line and DUV steppers. The facility is scheduled to open in summer 1997. Livingston was selected for the center due to NPE`s existing support operation in the area, as well as the planned growth in the UK semiconductor industry