Sputtering target

12/01/1996

Sputtering target

The Prelude diffusion bonded target assembly, designed for use with Applied Materials` Coherent TTN cathode, offers high power and high throughput - even with a collimator - in Ti or TiN sputtering processes that have high aspect ratio trenches and vias. Prelude provides cooler operation, with less deflection at all powers, as a result of improved thermal conductivity. Automated bead blasting and roughness control on critical surfaces of the target result in reduced flaking. Available in ultrahigh purities, Prelude has a target life of 250 usable microns of titanium on wafers using 1:1 collimator or 800 kWh. Tosoh SMD Inc., Grove City, OH; ph614/875-7912, fax 614/875-0031.