Photoresist purification

12/01/1996

Photoresist purification

Wafergard Chemical Dispense System-2 integrates two technologies for point-of-use photochemical dispense and filtration of g-line photoresist, solvents, and developers. The system eliminates microbubbles, and controls particle contamination. Microgard Minichem disposable pleated filters are integrated with a modular pump design that consists of the controller and the diaphragm pump, and can be installed on all coater/developer process equipment or merged in chemical management systems. The filter is available in 0.05, 0.1, and 0.2-?m pore sizes, and combines pleated technology and an ultrahigh molecular weight polyethylene (UPE) membrane. The membrane offers good chemical compatibility and the highest retention efficiency, >99.999% at the rated pore size. Millipore Corp., Bedford, MA; ph 800/221-1975 or 617/275-9200, fax 617/275-5550.