Flood exposure sources

12/01/1996

Flood exposure sources

These flood exposure sources are intended for photoresist imaging, stabilization, and photospeed verification applications; 350, 500, and 1000 W sources produce an intense source of light for shorter exposures, improving productivity. The spectral output of each source can be modified for DUV, near UV, i-line, or g-line output. Large uniform exposure areas allow the user to irradiate samples up to 10?10 in., or many smaller samples simultaneously. For maximum stability, accuracy, and consistent exposures of the sample, a light intensity controller and digital timer can be added. Each source can be integrated with mask alignment components and most wafer track systems. Oriel Instruments, Stratford, CT; ph 203/377-8282, fax 203/378-2457, e-mail [email protected]