Photoresist coating system

11/01/1996

Photoresist coating system

EV150 is an automated double-side photoresist coating system designed for MEMS applications. The system features a dispense mode for wafer edge protection, to improve yield with anisotropic etching, and a modular design to separate coater from control rack, minimizing particle generation. Throughput is up to 70 double-side coated wafers/hour. The system dispenses up to three resists, additional solvent, and adherence promoter, and is designed for 4-, 5-, 6-, and 8-in. wafer sizes, with autoload cassette-to-cassette handling. Electronic Visions Co., Phoenix, AZ; ph 602/804-0634, fax 602/804-0640