Thin film measurement system

12/01/1997

Thin film measurement system

This low-cost, thin film measurement system, the F20, measures the thickness, refractive index (n), and extinction coefficient (k) of dielectric or semiconductor thin films. Applications include table-top and in situ measurement of optical coatings, plastic films, and semiconductor process-related materials such as resist and oxide layers. The F20 measures virtually any film from 10 nm to 50 ?m in thickness. Film thickness and wavelength-dependent optical constants are determined by analyzing a sample`s reflectivity at 512 wavelengths; reflectivity data are acquired in <1 sec, with measurement results typically available in <2 sec. Filmetrics Inc., San Diego, CA; ph 619/554-0005, fax 619/554-1311, www.filmetrics.com, e-mail [email protected].