Edgebead exposure system

12/01/1997

Edgebead exposure system

The 2000E exposure system is designed for both full flood exposure and optical edge bead removal. It can be used for wafers of diameters up to 200 mm or rectangular substrates up to 200 ? 200 mm; an expanded version, Model 2000EX will handle 300-mm wafers and larger rectangular substrates. The system can be configured for deep-UV or near UV. The tool can provide up to 2000 W exposure intensities, and throughput can thus be matched to the user`s requirements; the system comes complete with exposure tool and a shadow mask tooling module that is designed for rapid alignment of the mask and easy mask exchange. OAI, Milpitas, CA; ph 408/263-4944, fax 408/263-6389.