DUV excimer laser

12/01/1997

DUV excimer laser

This new 248-nm excimer laser, designed for next-generation DUV steppers and scanners using high NA projection lenses, has a linewidth of <0.6 pm FWHM, and 95% of the laser energy is contained within a bandwidth of <2 pm. NovaLine LITHO/S has a polarization coupled resonator design that improves both spectral purity and laser operating efficiency. PowerLok is a real-time exposure control system that delivers an accuracy of