Sputtering targets

12/01/1997

Sputtering targets

UNIPHASE high-density, high-purity titanium aluminide sputtering targets feature highly uniform microstructures and fine grain size, as well as low gas levels and low alkali contamination. The targets are highly uniform, both radially and through the target cross section. They are produced using a vacuum hot processing technique in which controlled compression, temperatures, time, and vacuum aid in target densification and volatilization of low vapor pressure elements such as sodium, potassium, and lithium. Johnson Matthey Electronics, Spokane, WA; ph 509/924-2200, fax 509/922-8734