Optical lithography simulation guide

12/01/1997

Optical lithography simulation guide

This 175-page book titled Inside PROLITH: A Comprehensive Guide to Optical Lithography Simulation by Chris A. Mack provides a description of the physical models that are found in a group of lithography simulation products, PROLITH/2, PROLITH/3D, and PROXLITH/2, including derivations of most of the mathematical equations and physical descriptions of their basis. Chapters cover topics like introduction to lithography modeling; aerial image formation; standing waves; diffraction for contact and proximity printing; photoresist exposure kinetics; photoresist bake effects; photoresist development; linewidth measurement; lumped parameter model; lithographic analysis; and the uses of lithography modeling. A 116-word glossary is also included. ISBN 0-9650922-0-8. Price: $95. FINLE Technologies Inc., PO Box 162712, Austin, TX; ph 800/346-5360, fax 512/327-1510, e-mail [email protected], www.finle.com.