Lithography system for MEMS development

11/01/1997

Lithography system for MEMS development

The EV680 automated single step exposure system eliminates the need for contact between the mask and substrate. Because of the inherent thickness unevenness in silicon wafers, an alignment correction for wedge error is required for accurate exposure. Wedge error compensation used to require some contact between mask and substrate, but the EV680`s optical measurement system allows wedge error correction with no mask contact. This lengthens mask life, prevents contamination, and improves exposure accuracy. The optical measurement system determines the wafer`s thickness and makes the correct adjustments on the z-positioning system. Reduced operating costs, a smaller foot-

print, and higher throughput make the EV680 more cost-effective than stepper solutions for MEMS applications. The tool also includes cassette-to-cassette operation and a Class 1 minienvironment. Electronic Visions Inc., Phoenix, AZ; ph 602/437-9492, fax 602/437-9435, e-mail [email protected].