Recticle inspection enhancements

11/01/1997

Reticle inspection enhancements

Two new reticle and photomask inspection enhancements, the Advanced Performance Algorithm (APA) and the High Resolution (HR) option, make possible highly accurate and reliable inspection of 0.25-micron reticles, including those with complex OPC geometries. APA is a new feature for the RAPID 300 series reticle pattern inspection system; HR is an option for the STARlight reticle contamination inspection system. KLA-Tencor Corp., San Jose, CA; ph 408/875-3000, www.kla-tencor.com.