Photoresist removal

11/01/1997

Photoresist removal

The A3010 photoresist removal chamber is now available on this company`s Performance Enhancement Platform. The new tool, PEP 3010A, features lamp-based chamber heating (allowing rapid changes in chamber temperature), and closed-loop temperature control for precise monitoring of wafer temperature during processing. Modular design makes maintenance easy, and a user-friendly graphical user interface facilitates the tracking of wafer statistics. The PEP 3010A is compatible with both 150- and 200-mm wafers and is available with both SMIF and automatic guide vehicle options. GaSonics International, 408/570-7000, fax 408/570-7059, www.gasonics.com.