Total reflection x-ray fluorescence

11/01/1997

Total reflection x-ray fluorescence

Total reflection x-ray fluorescence analysis tools are widely used for elemental contamination control on silicon wafers; the TXRF 8030W combines extreme sensitivity with multielement capability and reliable operation. Applications include incoming inspection of starting material, monitoring of cleaning processes, and equipment setup and control. The tool operates under ambient conditions with sealed x-ray tubes, resulting in a small footprint (0.66 m2). Atomika Instruments GmbH, Munich, Germany; ph 49/89-315-89141, fax 49/89-315-5921, www.atomika.com, e-mail [email protected].