In-situ metrology system

09/01/1997

In-situ metrology system

The 1200-IS in-situ metrology system is a smart sensor for measuring rate, endpoint, and uniformity during both etching and deposition, in up to four processing chambers simultaneously. The system consists of up to four computer-controlled CCD-based sensors, filters, optics, and software. Each sensor head is mounted directly onto an etching or deposition tool, wherever there is a clear view of the wafer. The 1200-IS also incorporates advanced communication with both the tool and the fab, decreasing operator intervention, while providing advanced data for SPC. Low Entropy Systems, Boston, MA; ph 617/787-2100, fax 617/787-1477, e-mail [email protected], www.les.com