RTP processing Book

08/01/1997

RTP processing book

This 353-page, illustrated text titled Rapid Thermal Processing of Semiconductors reviews theoretical and experimental progress in the field. Based on the work of Victor E. Borisenko at the Minsk Radio-engineering Institute and the Physics Institute of Aarhus University, the book discusses a range of materials, processes, and conditions, and summarizes the results of research by international investigators. Contents include: transient heating of semiconductors by radiation; recrystallization of implanted layers and impurity behavior in silicon crystals; crystallization, impurity diffusion, and segregation in polycrystalline silicon; component evaporation, defect annealing, and impurity diffusion in III-V semiconductors; diffusion synthesis of silicides in thin-film metal-silicon structures; rapid thermal oxidation and nitridation; and rapid thermal chemical vapor deposition. Subject and author indexes are also provided. Authors: Victor E. Borisenko, Peter J. Hesketh. ISBN 0-306-45054-2. Price: $95 (US), $114 (outside US and Canada). Plenum Publishing Corp., New York, NY; ph 800/221-9369, fax 212/807-1047.