300-mm Wafer Edge Profile Comparator

08/01/1997

300-mm wafer edge profile comparator

Model 102C edge profile comparator allows nondestructive inspection of 300-mm wafer edge profiles. Control of edge contour can greatly reduce chipping and fracture, slip generation in furnace processes, particle generation, epitaxial edge crown, and photoresist edge bead. A correct edge profile improves gripping of the wafer in many handling processes, especially RTP and ion implantation. The 102C creates a shadow profile image, magnifies it 100 times, and displays it on a 12-in. monitor. Precision fixturing permits the user to rotate the wafer 360? and refocus the image as needed. By comparing the images with a template clamped to the monitor, the user can verify compliance to specifications, such as SEMI M1 or M9. H&L Instruments, North Hampton, NH; ph 603/964-1818, fax 603/964-8881.