Extended range of silicon wafers

08/01/1997

Post-ash residue remover

ST-200 is an inorganic stripper that removes high-density, post-ash plasma etch residues. It removes residues containing oxides and fluorides of aluminum and/or titanium from sub-0.5-?m vias and metal lines at low processing temperatures, without corrosion of aluminum/copper, 100% copper, titanium, titanium/tungsten, titanium nitride, or silicon oxide films. ST-200 contains no SARA-reportable components and no hydroxylamine, catechol, phenol, or chlorinated hydrocarbons. It is formulated to operate at very low bath temperatures, typically 21-35?C. ACSI Inc., Milpitas, CA; ph 408/321-8900, fax 408/321-9321.