Laser Exposure system

07/01/1997

Laser exposure system

The XL-2 laser exposure system is designed for 193-nm deep-UV photoresist research. It delivers programmed doses of 193-nm UV energy to experimental wafers. System features include: an optical attenuator to adjust beam fluence; a laser beam profiler to maximize beam uniformity; an in-line dose detector to monitor energy; UV lenses, to homogenize and shape the laser beam; a large exposure field (20 ??20 mm); a helium neon laser to align the optics; a nitrogen-purged beamline; and a control system to run multiple arrays/doses. Excimer Laser Systems Inc., Wayland, MA; ph 508/358-2215, fax 508/358-5033.