DUV photoresist

07/01/1997

DUV photoresist

ARCH 5200 is a deep UV photoresist that features 0.20-?m resolution and has 1.4-?m depth of focus for 0.30-?m contact holes. It is based on acetal chemistry with cross-linked polymer technology, for very good post-coat and post-exposure delay stability. ARCH 5200 also exhibits low sensitivity to changes in post-exposure bake temperatures, as well as thermal deformation temperatures exceeding 135?C. Olin Microelectronic Materials, Norwalk, CT; ph 401/435-2613.