Issue



OPC software


07/01/1997







OPC software

Depict 4.2 introduces two enhancements for improved photomask printability: automatic printability analysis and the Optical Proximity Correction Advanced Application Module. Both capabilities automatically correct mask failures through resolution enhancement for printing deep sub-?m features. The enhanced printability analysis, combined with Depict`s large aerial image capability, automatically identifies the mask layout areas that will fail to print features correctly. Based on user-specified error criteria, the visualization tool highlights the failed portions, for easy diagnostics. Technology Modeling Associates Inc., Sunnyvale, CA; ph 408/328-0930, fax 408/328-0940, URL http://www.tmai.com.