Stepper series

06/01/1997

Stepper series

Three new i-line lithography systems, based on the Saturn platform, provide simplified optics and a large field size that can mix and match with both leading-edge 5? steppers and advanced step-and-scan systems. Saturn I, designed for mature fabs, provides 1-?m resolution and alignment capability of 120 nm; Saturn II, for production of 16- and 64-Mbit DRAMs, features 0.8-?m resolution and alignment of 90 nm; and Saturn III, for mix-and-match with step-and-scan systems in 0.35- to 0.25-?m processes, can expose a full step-and-scan field in one exposure. The system features 0.65-?m resolution and 80-nm alignment. The Saturn family`s common platform is designed to address future 300 mm requirements. All three of the new systems are backward-compatible with previous generations of steppers from this company. Ultratech Stepper Inc., San Jose, CA; ph 408/577-3116, fax 408/325-6444.