PVD cluster tool

06/01/1997

PVD cluster tool

The Inova PVD cluster tool offers low-cost, production-worthy metallization for 0.18-?m geometries and beyond. Among the cost-saving features is the system`s sputtering source, which extends planned maintenance intervals by delivering high material utilization for longer target and shield life. Inova`s ultrahigh vacuum system provides very good device yields and film quality by achieving a very low base pressure and high gas conductance. This is achieved through the technique of sequential, individually pumped stages, coupled with the use of cryopumps at every stage, mirror-finished stainless steel surfaces throughout the system, metal seals instead of o-rings, and a process gas delivery system that employs active gas cleansing for ultrahigh purity. Inova has a small footprint, easy-to-access process modules, and fiber optics for interruption-free communication. Varian Semiconductor Equipment, Palo Alto, CA; ph 415/424-5781, e-mail [email protected], URL http://www.varian.com.