Integrated CMP system

06/01/1997

Integrated CMP system

PRI Automation`s chemical mechanical polishing (CMP) autoload system is the first integrated system that automates material transport, handling, and scheduling among polishing and cleaning equipment within a CMP or planarization work cell. Integration reduces tool downtime and increases cell throughput by ensuring that material is continually rotated among polishers and cleaners, while eliminating the need for operators. Designed for Class 1 cleanroom environments, the system has performed at greater than 99% uptime during in-fab operation, according to the company. PRI`s CMP Autoload system includes the 6-axis, track-guided RoboTrak cleanroom robot and the company`s Operator I/O port. The system is compatible with polishing and cleaning equipment from all major vendors, and can interface with a cell`s operator I/O port or with a fab`s interbay automation system, handling 150- or 200-mm cassettes and SMIF pods. PRI Automation Inc., Billerica, MA; ph 508/663-8555