Laser exposure system

06/01/1997

Laser exposure system

The XL-2 laser exposure system is designed for 193-nm deep-UV photoresist research. It delivers programmed doses of 193-nm UV energy to experimental wafers, which are used in the development of next-generation photoresists. System features include: an optical attenuator, to adjust beam fluence; a laser beam profiler, to maximize beam uniformity; an in-line dose detector, to monitor energy; UV lenses, to homogenize and shape the laser beam; a large exposure field (20 ? 20 mm); a helium neon laser, to align the optics; a nitrogen-purged beamline; and a control system to run multiple arrays/doses. Excimer Laser Systems Inc., Wayland, MA; ph 508/358-2215, fax 508/358-5033.