Excimer laser systems for TFT annealing

05/01/1997

Excimer laser systems for TFT annealing

Developed specifically for TFT annealing, these excimer laser systems have up to 200 W of output power, 670 mJ pulse energy, 300 Hz repetition rate, and 300-mm line beam length on the substrate. The advantages of excimer-laser-generated polycrystalline-silicon TFTs are: high process quality and reproducibility; uniform high carrier mobility (>300 cm2/Vs); uniform grain size; localized driver transistors on the wafer; no expensive quartz substrates; increased throughput, due to elimination of time-extensive heating procedures; and reduction in production costs. Lambda Physik Inc., Fort Lauderdale, FL; ph 954/486-1500, fax 954/486-1501.