Resist development analyzer

05/01/1997

Resist development analyzer

The RDA Model-790 is an 18-channel photoresist development rate monitor that allows semiconductor and resist manufacturers to investigate efficiently the issues relating to their lithography processes. Users can characterize the resist process, investigate post-exposure bake and developer conditions, compare different resists, and determine accurate resist modeling parameters for use with PROLITH lithography simulation tools. Model-790 has 18 individual channels to measure multiple exposure fields on one wafer and automatically extract the resist modelling parameters from the data. FINLE Technologies Inc., Austin, TX; ph 512/327-3781, fax 512/327-1510, e-mail [email protected], URL http://www.finle.com.