SMIF enclosure for CV/IV system

05/01/1997

Ion implanter for AMLCDs

Specifications for this ion implanter, designed for AMLCDs, are throughput of >60 sheets/hour for doses to 2 ? 1015 ions/cm2; maximum plate size of 600 ? 720 mm; an RF excited ion source (no filament) producing ion species of P, B, and H over a range of 2-100 keV, with a maximum current density of 100 dopant ?A/cm2, adjustable H+ content, and a uniformity of