CVD film

03/01/1997

CVD film

This dicholorosilane (DCS) chemical vapor deposition (CVD) film, named LRS for its low-resistance, low-stress capabilities, offers improved adhesion and 20% lower sheet resistance after anneal than standard DCS films. It also permits tungsten silicide-based processing of advanced devices into the 0.18-?m generation, and offers good step coverage, low fluorine content, and a high deposition rate. Genus Inc., Sunnyvale, CA; ph 408/747-7120, fax 408/747-7199, http://[email protected].