rapid thermal and integrated processing volume

02/01/1997

Rapid thermal and integrated processing volume

A 580-page volume titled Advances in Rapid Thermal and Integrated Processing details the proceedings of the NATO Advanced Study Institute, Acquafredda di Maratea, Italy, July 3-14, 1995. Topics covered include the thermophysics of photon-induced annealing of semiconductor and related materials; the modeling of reactor designs and processes; process integration, which treats advances in basic equipment design, scale-up, and integrated cluster-tool equipment, including wafer cleaning and integrated processing; and the deposition and processing of thin-epitaxial, dielectric, and metal films. The volume is edited by Fred Roozeboom. Price: $265. Kluwer Academic Publishers Group, Dordrecht, The Netherlands; ph 31/78-639-2392, fax 31/78-654-6474, e-mail [email protected].