Medium current implanter

02/01/1997

Medium current implanter

The NV-8250 medium current implanter is designed to address process requirements for self-aligned channeling implants with large tilt angles and high-energy retrograde wells. Its final energy filter, combined with a beam parallelizing technique, delivers pure, parallel and repeatable beams across the full energy range from 3 to 750 keV, with tilt angles up to 60?. The system`s extended life source (ELS) demonstrates a twofold improvement in source life by comparison with the traditional Bernas source; the ELS also offers the highest available multiply charged ion beam current. The angular energy filter provides good energy purity with the multiply charged ions typically employed for high-energy retrograde well applications. The use of an electrostatic clamp eliminates the need for frontside wafer clamps. This translates into full exposure of the wafer to the beam, resulting in more viable die (due to the elimination of shadowing) and reduced contamination. Eaton Corp. Semiconductor Equipment Operations, Beverly, MA; ph 508/921-0750, fax 508/927-3652.