Noncontact measurement

01/01/1997

Noncontact measurement

The TMS-2000W and TMS-3000W scatterometry-based surface measurement systems provide noncontact measurement of wafer microroughness at a rate of up to 50 test points/sec with 0.01-? resolution. Both systems provide high-speed, precise determination of microroughness over pre-selected areas or over the entire wafer surface. Applications include backside roughness, post-etch roughness, post-CMP processing, and wafer slip evaluation following RTP or epi growth. The systems can scan up to 6000 test points in <4 min, providing texture data (RMS and Ra) over the entire surface with ?0.2 ? measurement repeatability. Veeco Instruments Inc., Plainview, NY; ph 516/349-8300, fax 516/349-8321.