Inventor's Corner
06/01/2004
Connection system
An objective of this invention is to provide an aseptic connection system that can operate without a cleanroom, and to provide a connection means that is compatible with standard sanitary fittings common to the biotech industry. The system features a highly flexible and transparent sterile barrier, or card (A). A card adhesive label (B) forms a sterile safety zone. A conduit aperture (C) is provided through the support card and card adhesive label. A rolling membrane (D) has a first membrane fold (E), second membrane fold (F), and a membrane pull grip (G). The area between the first membrane fold and the second membrane fold on the front of the card adhesive label forms a front first fold release coating that is in contact with the adhesive front card label surface. While in contact, the sterile safety zone is protected from contamination, even in a contaminated setting.
Patent number: 6,679,529 B2
Date granted: Jan. 20, 2004
Inventors: Theodore D. Johnson and Robin M. Boley-Johnson, Clearwater, Fla.
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High-temperature gaseous filtration fabric
This pleated, stiffened filtration fabric is designed to prolong the rigidity and efficiency of commercial and industrial "baghouse" particulate collectors, particularly when installed in high-temperature applications where the gaseous discharges exceed 450 degrees F. A stiffening system of three distinct layers is applied sequentially to a woven fiberglass fabric. The inner layer (B) functions as a silicon-based lubricant. The treated fabric is then heated to 350 degrees F for one minute. Next, an intermediate, resin-based stiffening layer (C) is applied to the fabric. Again, the treated fabric is heat-dried, this time for one minute at 250 degrees F. Finally, a PTFE dispersion-based outer protective layer (D) is applied to provide a shield against abrasion and erosion of the stiffening layer. Once more, the treated fabric is heated for one minute to 250 degrees F. The fully treated fabric is then pleated with folds 1/4-inch wide and creases 3/4-inches deep.
Patent number: 6,734,122 B2
Date granted: May 11, 2004
Inventors: Scott A. Hunter of BGF Industries, Inc. Greensboro, N.C.
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Controlled release anti-microbial hard surface wiper
The wiper is designed to disinfect hard surfaces while inhibiting cross-contamination, and contains an anti-microbial agent that is slowly released when contacted by water. This allows the wiper to provide an anti-microbial solution and to sustain its effectiveness after repeated washing and rinsing. The wiper contains a substrate layer, which can be any material commonly used to manufacture wipers; typically, hydrophobic material. In addition, a laminate layer includes any absorbent material that can be bonded to the substrate layer. The wiper also includes any anti-microbial agent that can be controllably released over an extended period of time after repeated washing and rinsing. Particulate forms of an anti-microbial agent are coated with various polymers so that the particles are partially encapsulated; a lower release rate is generally provided for a particle having a thicker or more complete coating, and vice-versa.
Patent number: 6,734,157
Date granted: May 11, 2004
Inventors: Fred R. Radwanski, Stone Mountain, Ga.; James W. Clark, Roswell, Ga.; and Ralph L. Anderson, Marietta, Ga. Assignee: Kimberly-Clark Worldwide Inc. Neenah, Wisc.
Dry-surface cleaning apparatus
Surface contamination, such as micron and submicron-sized particles on semiconductor surfaces, can pose serious problems, such as device circuit failure and yield loss. The invention provides a dry-surface cleaning apparatus for converging a laser beam on a laser focus located in a sealed chamber to generate a plasma shock wave around the laser focus that removes a plurality of surface contaminants on a workpiece in the sealed chamber. The apparatus includes a laser (A) for generating a laser beam (B), a sealed chamber (C) in which a cleaning process is performed, and a laser-focusing lens (D) for converging the laser beam. The laser beam is then reflected with a reflection mirror (E), and then proceeds into the sealed chamber where it may be converged on a laser focus (F) located around a surface of a workpiece (G). The beam then causes a plasma shock wave (H), which then collides with the surface workpiece and dislodges surface contaminants.
Patent number: 6,734,388
Date granted: May 11, 2004
Inventors: Jong-Myong Lee and Sung Ho Cho, of Yon-gin-si, South Korea, Assignee: IMT Co., LTD.
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